Jerry Tsai, ABB Taiwan, 2011/8/26. Wet Process Analyzer. ABB Group September 5, 2011 Slide 1

Transcription

1 Jerry Tsai, ABB Taiwan, 2011/8/26 Wet Process Analyzer September 5, 2011 Slide 1

2 ur Markets Markets Petroleum Pharmaceutical Academic Dairy Chemical Semiconductors Environmental EM September 5, 2011 Slide 2

3 What is WPA? Wet Process Analyzer ABB s solution for real-time, on-line wet process monitoring and control in the Semiconductor and TFT- LCD industry September 5, 2011 Slide 3

4 Wet Process Analyzer Sampling ClippIR + the Patented Teflon Cell (¾ inch or ½ inch tubing) 1. Unscrew the Cap 2. Insert Tubing into the Slot 3. Screw on Cap Installed!! September 5, 2011 Slide 4

5 Wet Process Analyzer: features September 5, 2011 Slide 5

6 Communication Supplied as Standard Protocols with FTSW PC Protocol September 5, 2011 Slide 6 An Ethernet Communication Link Provides for high / low (digital like) inputs and outputs Provides predicted value outputs Requires an PC client on the control system side. PC is a Microsoft communication protocol standard 2. MDBUS Protocol A serial communications link Works on RS-232 Works on RS-485 if a 232 / 485 converter package is employed Provides for high / low (digital like) inputs and outputs Provides predicted value outputs Requires a MDBUS RTU master on the control system side. MDBUS emulates a hardwire communication, but the communication is performed through a single serial cable MDBUS is used in a wide variety of industries Both PC and MDBUS will accept inputs from most benches without additional hardware requirements.

7 WPA Maintenance Instrument Check During operation instrument continuously performs selfdiagnostics Complete instrument re-validation can be performed any time by an operator by launching pre-configured test sequences (5 min) Preventive Maintenance NIR source replacement Source lifetime: 9-12 months (instrument on 24/7) Recommended replacement every 6 months Replacement + test takes ~3h Can be performed by customer September 5, 2011 Slide 7 Laser replacement Recommended replacement every 3 years Replacement & Test requires ~4h Must be performed by certified service engineer

8 WPA Maintenance Key Figures WPA Maintenance Equipment Uptime: 99.5% / Year 2 days for source replacement (1every 6 months) Mean Time Between Failures (MTBF) 5 year Parts #SMA1700G #SMC2900G September 5, 2011 Slide 8

9 ABB Michelson FT-IR He-Ne laser Scan arm Moving Coil Cube Corner Mirrors Beam Splitter September 5, 2011 Slide 9

10 Light Source-replacement September 5, 2011 Slide 10

11 Why WPA? QC September 5, 2011 Slide 11

12 How? ABB Wet Process Analyzer September 5, 2011 Slide 12

13 FTNIR instruments September 5, 2011 Slide 13

14 September 5, 2011 Slide 14

15 ABB WPA (< 25 seconds) (up to 6+) Bench/per WPA (Ethernet) September 5, 2011 Slide 15

16 Supported Chemicals by WPA SC1 (APM) SC2 HF (DHF) SPM (Piranha) HF-HCl BE (BHF) DSP KH / H22 AFN EG-HF Vapox Etch SILX TMAH TMAH / H22 Citric Acid NH 4 H 2 HCl 2 HF H 2 S 4 2 HF, HCl NH 4 F, HF H 2 S 4 2 KH 2 Acetic Acid, HF, HN 3 Ethylene Glycol, HF Acetic Acid, Ethylene Glycol, HF NHF 4, HF, Ethylene Glycol TMAH TMAH 2 Citric Acid Phosphoric Acid H 3 P 4 MAE (HF type) H 3 P 4, HN 3, HF MAE (AA type) BSG (SHF) IPA/KH H 3 P 4, HN 3, Acetic Acid HF S 4 IPA, KH Microstrip-5002 EKC 265 Kanto Deer Clean ESC MR 10 ESC 784 ESC 774 ST-250 ST-255 REZI-38 ALEG310 CLK 888 ACT 930 ACT 970 September 5, 2011 Slide 16

17 Applications For DRAM application: Clean (SC1/HF/HCl/BHF ) Etch (SPM/DSP+/HCl) CMP (SC1/H22) For TFT-LCD: AU, PR-Stripper(N300/TK-106/DPS3300) Al Etch (H3P4, HN3, H2, Acetic Acid) For Solar cell : Etch (IPA-KH/HN3-HF-H2SiF6) Clean (HF/HCl) Customized applications TSMC,Du Pont CLC32 EKC ABB 05 September 2011 Slide 17

18 FTPA : ABB Installed base 2008: ~250 WPA, 800 Clippirs (1/3 Europe, 1/3 Asia, 1/3 USA) ABB Semiconductors, SWITZERLAND Advanced Micro Devices, GERMANY Advanced Micro Devices, USA Akrion, USA ALTIS, FRANCE ATMEL, FRANCE ATMI, USA AU, TAIWAN CPT, TAIWAN Dalsa Semiconductors, CANADA Dongjin SemiChem, KREA Fraunhofer Institute, GERMANY Freescale MS 12, USA Infineon Technologies, GERMANY Infineon Technologies, AUSTRIA INTEL, USA LAM Research, USA Mattson Wet Products, USA Micron Technology, USA Mitsubishi Chemical Engineering, JAPAN Northrop grumann, USA Philips Semiconductors, NETHERLANDS ProMS Technogies, TAIWAN Samsung Electronics, KREA Samsung Electronics, USA Samsung SDI, KREA SCP Global Technologies, USA Seki Technotron, TAIWAN Semitool, USA SEZ, AUSTRIA SMIC, CHINA STI, KREA SunPow er, PHILIPPINES Tateyama Devices, JAPAN Wacker Siltronic, GERMANY Wafer Works Corporation, TAIWAN September 5, 2011 Slide 18

19 WPA Payback Assessment: Economic Data Eliminating production excursions caused by unregulated photoresist baths that was my main goal when installing ABB s WPA. I not only met this goal, I exceeded it: the WPA enabled us to eliminate scrap and extend overall bath life by 23%. We estimate combined savings from a reduction of chemicals purchased (thanks to extended bath life), lower disposal costs of used chemicals and reduced excursion risk has resulted in a savings of over $600,000 US per year.

20 WPA Results: DSP with Spiking

21 September 5, 2011 Slide 21