STP-iX455 Turbomolecular vacuum pump

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STP-iX455 Turbomolecular vacuum pump 78 The STP-iX455 turbo-molecular pump features an innovative, magnetic bearing and motor drive system, providing a 50% reduction in vibration compared to previous generation turbo pumps. An integrated controller eliminates the need for a conventional, rack-mounted controller and interconnecting cables, and does not require water cooling. The pump features 450 l/s pumping speed for nitrogen. The STP-iX455 is an excellent fit for electron microscope, metrology, lithography and other vibration sensitive applications. Features & Benefits Compact Design including a fully integrated controller Inovative, Self-Sensing magnetic bearing system Digital 5-axis control Vibration levels reduced by 50% compared to the existing turbo pumps Can be configured to run corrosive processes Dimensions Applications Plasma etch (chlorine, fluorine and bromine chemistries) for metal (aluminum), tungsten and dielectric (oxide) and polysilicon Electron cyclotron resonance (ECR) etch Film deposition CVD, PECVD, ECRCVD, MOCVD Sputtering Ion implantation source, beam line pumping end station Performance Curves 1. N (450 ls ) (ISO160, VG150). H (460 ls ) (ISO160, VG150) 3. N (300 ls ) (ISO100, VG100) 4. H (300 ls ) (ISO100, VG100) Inlet Flange A B ISO100 130 (5.1) 1 (0.47) DN100CF 15 (5.98) 1 (0.83) VG100 18 (7.17) 1 (0.47) ISO160 180 (7.09) 1 (0.47) DN160CF 03 (7.99) (0.87) VG150 35 (9.5) 1 (0.47)

Technical Data Ordering Information Inlet flange Pumping Speed ISO100K N 300 ls H 300 ls Product Description STP-iX455 Turbomolecular pump ISO100K STP-iX455 Turbomolecular pump ISO160K STP-iX455 Turbomolecular pump DN100CF STP-iX455 Turbomolecular pump DN160CF PT640Z010 PT640Z00 PT640Z050 PT640Z060 Compression ratio N >10 8 H >1 x 10 4 Ultimate pressure Max working pressure Allowable backing pressure Rated speed Starting time Mounting position Cooling method Lubricating oil 6.5 x 10-6 order Pa 1.3 x 10 Pa 67 Pa 55000 rpm <6 min Any orientation Natural cooling (water cooling or air cooling when baking and gas pumping) Not necessary Backing pump 40 lmin Accessories & Spares idt-001 Display unit ips40 Power supply STP-iX455-iPS40 interconnection cable 5 m STP-iX455-iPS40 interconnection cable 10 m STP-iX455-iPS40 interconnection cable 15 m STP-iX455-iPS40 interconnection cable 0 m Power supply cable for ips40 3m Power supply cable for ips40 5m PT64W1Z00 PT64W0Z00 PT64Y0B0 PT64Y0B30 PT64Y0B40 PT64Y0B50 PT64Y0A10 PT64Y0A0 79 Leakage Magnetic Flux Axial direction Radial direction <100 m/gauss <100 m/gauss Ambient temperature range 0 to 40 C Storage temperature range -5 to 55 C Weight 15 kg

STP-iXR1606 Turbomolecular vacuum pump 80 STP-iXR1606 series magnetically levitated turbo-molecular pump provides industry-leading performance and incorporates latest technology small power supply into the onboard control which is the same concept with STP-iXA06/iXA3306 series. The pumping performance is improved by the newest developed revolutionary rotor design. This fully integrated product offers easy installation and small footprint as an all-in-one solution for all application tools. Features & Benefits Eliminates connection cable between pump and control unit. Eliminates installation space and cost required by conventional rack type control unit. Compact design results in easy installation and small foot print. Highest pumping speed in the 8 TMP class, along with the STP- A1603. 3% reduced power consumption in the high gas flow area. Dimensions Applications Glass Coating Solar PVD Industrial Sputtering Performance Curves

Technical Data Ordering Information Intel Flange Size VG00/VG50 VG150 ISO00F/ISO50F ICF53/ICF305 ISO160F ICF03 Backing port size KF40 KF40 Pump Speed N 1600 ls H 100 ls Compression ratio N >10 8 900 ls 600 ls >10 8 Product Description STP-iXR1606 ISO00F STP-iXR1606 VG00 STP-iXR1606 ISO50F STP-iXR1606 ISO160F STP-iXR1606 VG150 STP-iXR1606 ISO00F with Profibus STP-iXR1606 ISO50F with Profibus Accessories & Spares idt-001 Display Terminal Power cable 3m YT790Z010 YT790Z00 YT790Z040 YT790Z070 YT790Z080 YT790Z100 YT790Z110 YT79U1Z00 YT79Y0A01 81 H 1 x 10 3 1 x 10 3 Ultimate pressure 10-7 Pa (10-9 Torr) 10-7 Pa (10-9 Torr) Allowable backing pressure Max Gas size N (water cooled only) 66 Pa ( Torr) 66 Pa ( Torr) 4700 sccm 4700 sccm Power cable 5m Power cable 10m Power connector only YT79Y0A00 YT79Y0A03 PTZ003114 Max Gas size Ar (water cooled only) (7.94 Pam 3 s ) (7.94 Pam 3 s ) 1800 sccm 1800 sccm (3.04 Pam 3 s ) (3.04 Pam 3 s ) Rated speed 36,500 rpm 36,500 rpm Starting time 8 min 8 min Mounting position Any orientation Any orientation Input voltage Maximum input power 00 to 40 (± 10) V a.c. 750 VA 750 VA -Weight 48 kg 48 kg- 00 to 40 (± 10) V a.c.

STP-iXA06C Turbomolecular vacuum pump 8 The STP-iXA06 series magnetically levitated turbomolecular pump provides industryleading performance and incorporates a small power supply into the onboard control unit the latest technology of the well-established STP-iXA05 series. The height of the pump is equal to the STP-A03C and is also equal to the height of the STP-iXA05 series without it s power supply (ips00). This fully integrated product offers easy installation and a small footprint as an all-in-one solution for all application tools. Features & Benefits Compact design including a fully integrated controller Inovative, self-sensing magnetic bearing system Digital 5-axis control Vibration levels reduced by 50% compared to the existing turbo pumps Can be configured to run corrosive processes Dimensions Applications Plasma etch (chlorine, fluorine and bromine chemestries) for metal (aluminium), tungsten and dialectric (oxide) and polysilicon Electron cyclotron resonance (ECR) etch Film deposition CVD, PECVD, ECRCVD, MOCVD Sputtering Ion implantation source, beam line pumping and station Performance Curves Inlet portflange VG50 ISO50F ICF305 ØA 350 335 305 ØB 96 96 96 C 18 16 8 D 35 45 75 E 395 405 435 F 31 3 35 G 81 91 31 H 83 93 33 I 3 33 3

Technical Data Ordering Information Inlet flange size Backing port size Pump speed N /Ar ISO50F/VG50/ICF305 KF40 00/1900 ls Compression ratio N /H >10 8 / 1 x 10 4 Product Description STP-iXA06C ISO50F STP-iXA06C VG50 STP-iXA06C DN50CF STP-iXA06C ISO50F with Profibus YT810Z010 YT810Z00 YT810Z030 YT810Z040 Ultimate pressure Allowable backing pressure Max gas flow N * (water cooled only) Max gas flow Ar * (water cooled only) 10-7 Pa (10-9 Torr) 66 Pa ( Torr) 3000 sccm (5.07 Pam 3 s ) 1400 sccm Accessories & Spares idt-001 Display unit Power Cable 10M Power Cable 15m Power Cable 5m YT63U1Z30 PT35Y0A00 B75030430 B7503000 83 Rated speed (.36 Pam 3 s ) 7000 rpm Run-up time to 90% rated speed <8 minutes Mounting position Input voltage Max input power (without TMS) Weight Any orientation 00-40 V 100 VA 6 kg * The maximum gas flow is applicable under conditions that N or Ar gas is pumped continuously with water cooling temperature between 15-5 C and the backing pump (10,000 l/min size) is used. It is changed on condition.

STP-iXA3306C Turbomolecular vacuum pump 84 The STP-iXA3306 series magnetically levitated turbomolecular pump provides industryleading performance and incorporates a small power supply into the onboard control unit the latest technology of the well-established STPiXA3305 series. The height of the pump is equal to the STP-XA703/XA303 and is also equal to the height of the STP-iXA3305 series without its power supply (ips00). This fully integrated product offers easy installation and a small footprint as an all-in-one solution for all application tools. Features & Benefits Compact design including a fully integrated controller Inovative, self-sensing magnetic bearing system Digital 5-axis control Vibration levels reduced by 50% compared to the existing turbo pumps Can be configured to run corrosive processes Dimensions Applications Plasma etch (chlorine, fluorine and bromine chemestries) for metal (aluminium), tungsten and dialectric (oxide) and polysilicon Electron cyclotron resonance (ECR) etch Film deposition CVD, PECVD, ECRCVD, MOCVD Sputtering Ion implantation source, beam line pumping and station Performance Curves Inlet portflange VG50 ISO50F VG300 ISO30F ICF305 ICF356 ØA 350 335 400 45 305 356 -ØB 358 358 358 358 358 358 C 15 15 18 0 8 8.5 D 81 81 4 4 86 81 E 435 435 396 396 440 435 F 363 363 35 35 368 364 G 30 30 8 8 35 31 H 319 319 81 81 34 30 I 51 51 1 1 56 51

Technical Data Ordering Information Inlet flange size Backing port size ISO50F / VG50 / ICF305 KF40 Pumping speed N 650 ls Pumping speed Ar 300 ls Compression ratio N /H >10 8 / x 10 3 Ultimate pressure Allowable backing pressure Max gas flow N *(water cooled only) Max gas flow Ar * (water cooled only) 10-7 Pa (10-9 Torr) 66 Pa ( Torr) 4000 sccm (6.76 Pam 3 s ) 100 sccm Product Description STP-iXA3306C ISO50F STP-iXA3306C VG50 STP-iXA3306C ISO30F STP-iXA3306C VG300 STP-iXA3306C ISO50F with Profibus STP-iXA3306C ISO30F with Profibus Accessories & Spares idt-001 Display unit Power Cable 5m Power Cable 10M Power Cable 15m YT80Z00 YT80Z030 YT80Z040 YT80Z050 YT80Z060 YT80Z070 YT63U1Z30 B7503000 PT35Y0A00 B75030430 85 Rated speed Starting time Mounting position Input voltage Max input power without TMS Max input power with TMS Weight (3.55 Pam 3 s ) 7700 rpm <10 minutes Any orientation 00-40 V 1500 VA 1800 VA 80 kg * The maximum gas flow is applicable under conditions that N or Ar gas is pumped continuously with water cooling temperature under 5º C and the backing pump (10,000 l/min size) is used. It is changed on condition.