Th Dvlopmnt of WatrSim 4.0 A Dynamic Simulation Modling Claning Procsss in Smiconductor Wafr Manufacturing (Thrust C, Task C-5) C Jssica Jnsn, Wi Li, Mik Schmotzr,Farhang Shadman, and Gary W. Rubloff : Dpartmnt of Chmical and Environmntal Enginring, Univrsity of Arizona : Dpartmnt of Matrial Scinc and Enginring and th Institut for Systms Rsarch, Univrsity of Maryland, Collg Park
Stratgic Plan 4 5 6 7 8 9 Nw Chmistris and Procsss Us Rduction Rus and Rcycl Abatmnt and Discharg Control Nw BE procsss / nw low-k Nw FE procsss/nw high-k Nw pattrning procsss Nw watr purification procsss CMP wast rduction Low chmical surfac prp Low-watr rins procsss Low-nrgy procsss Chmicals rcycl and rus Watr rcycl and rus Novl plasma ractor abatmnt CMP wast tratmnt Wast watr tratmnt 8 5 5 0 6 4 8 Intgratd ESH Assssmnt 6 6 8 5 7 7 9 8 07 8 4 8 Front End Procsss Factory Intgration Back End Procsss ESH Bnign Manufacturing Thrust A Thrust B Thrust C Thrust D Dlivrabl Major Dlivrabl Tstd
Projct Objctivs Compltly rbuild simulation modling smiconductor wafr claning procss, WatrSim.0 Incras structural organization by using vctors and mbddd functions Incorporat ralistic purification (UPW) modl, wafr claning rlationships and paramtrs, and rcycling control algorithms WatrSim 4.0 is a simulator basd larning systm for nvironmntally bnign smiconductor manufacturing Dmonstrats watr-us rduction Dals with optimization of ultra pur watr (UPW) / purification modls Undrstanding procsss in smiconductor manufacturing and multi-componnt systms
Watr Rcycling SYSTEMS LEVELS - Aggrgation - Optimization - Dcision support ARCHITECTURE - Squncs - Componnt populations - Oprations algorithms COMPONENTS - Procss tools - Infrastructur lmnts multipl mtrics assssd at multipl lvls TECHNOLOGY - Mat s & dv prf - Yild - Rliability MANUFACTURING - Throughput, cycl tim - CoO - Risk ESH METRICS Watr rcycling - ESH-CoO - Envir byond fab - Halth - Safty
Wafr Claning Flow Chart Watr Inlt Flow Inlt Tank Wast Flow Intrchangabl Purification / UPW Units Wafr Rins Tank a Wafr Rins Tank b Snsor & Control Valv Wast Flow Wafr Rins Tank c Rcycl Flow
Structural Simplification Using Vctors Flow: Inlt Flow: Rcycl Matrial Balanc For Stram Flow: Inlt Flow: Rcycl Inpurity : Inlt Impurity : Inlt Flow: Stram Inpurity : Inlt Impurity : Rcycl Impurity : Stram Impurity : Inlt Impurity : Rcycl Impurity : Stram Impurity : Rcycl Impurity : Rcycl 4 6 S->V Inlt Stram S->V Inlt Stram Rcycl Stram Rcycl Stram Stram 4 6 Simplifid Matrial Balanc Using Vctors
UPW Modl v o C inlt v o C outlt L d ( ) B A C C L) C(z inlt outlt L v D d 5 L v D d 50 R o o - B - A L v D d 5 L v D d 50 R o o 5 R 50 R 4 m L 4 m d
Simulation Rsults 0 Wafr Rins Tank Volum (m ) VS Tim (Sc) Wafr rins tank filling 5 Inlt tank filling 0 5 0 0 4 6 8 0 4 Start wafr rins 5.00 4.50 4.00.50.00.50.00 impurity flux (molculs/sc) rmaining wafr impurity (molculs) Exponntial dcay of impurity flux: d / [ C t Tau o ( )] dt.50.00 5.09 0 0 4 6 8 0 4
Simulation Rsults Concntration of Impurity in ppb 7 6 5 4 8 Impurity and concntration in wafr rins tank p p y g 0 0 0 0 0 40 50 60 70 80 90 Dip rat: on wafr pr 0 sconds. Impurity concntration in wafr rins tank will build up whn wafr dip rat is too high bcaus flow is not adquat Concntration of Impurity in ppb 7 6 5 4 0 0 5 0 5 0 5 0 Dip rat: on wafr pr 5 sconds.
Futur Plans Intrchangabl Rvrs Osmosis and Activatd Carbon purification units Kping track of mor impuritis in strams/wafrs Dvlopmnt of Graphical Usr Intrfac (GUI) using SimPLE and Dlphi Softwar Dynamic systms analysis for transints and upsts rlvant to control and rliability
Industrial Collaboration/Tchnology Transfr Collaboration with Txas Instrumnts (J. DGnova) Enginring WatrSim 4 simulator will b availabl for us and partnring Significantly nhancd analytical and dsign capability Intrchangabl UPW componnts Multipl rins tanks Transint/upst analysis Dvlopmnt of optimizd and robust snsor/control systms and algorithms Education WatrSim has bn availabl and usd in UA classs A mor powrful WatrSim 4 will b mad availabl
Conclusions Complt rbuild of WatrSim to optimiz modl dsign and vrsatility Intrchangabl componnts, flxibl control algorithms, multicomponnt impurity strams, rusabl modl lmnts, distributd rins tanks, Nw simulator compatibl with advancd larning platform (SimPLE) to tach DFE (Dsign for Environmnt)