DENTON VACUUM UNIVERSITY OF UTAH

Transcription

1 DENTON VACUUM DISCOVERYTM-18 DEPOSITION SYSTEM OPERATING MANUAL UNIVERSITY OF UTAH JOB #: Tel: Fax: DENTON VACUUM, INC North Church Street, Moorestown, NJ December 1996

2 Table of Contents Denton Vacuum. Inc. DiscoveryTM-18 Deposition System TABLE OF CONTENTS Section Page 1. INTRODUCTION SAFETY WARNINGS SYSTEM SPECIFICATIONS Deposition Chamber Loadlock Chamber Deposition Chamber Pumping System Loadlock Pumping System Vacuum Gauging/Process Gas 3-3 and Pressure Control 3.6 Sputter Sources Sputter Power Supplies RF-Bias Substrate Stage Substrate Heat System Control and Automation Utilities System Documentation Sputter Targets SYSTEM OPERATION 4.1 Cold Start 4.2 System Pumping and Venting Main Chamber Pumping - Automatic Mode Main Chamber Pumping - Manual Mode Loadlock Pumping - Automatic Mode Loadlock Pumping - Manual Mode Main Chamber Venting - Automatic Mode Main Chamber Venting - Manual Mode Loadlock Venting - Automatic Mode Loadlock Venting - Manual Mode 4.3 Manual Processing Loadlock to Chamber Substrate Transfer

3 Table of Contents Denton Vacuwn. Inc. DiscoveryTM-18 Deposition System TABLE OF CONTENTS Section Page 4. SYSTEM OPERATION (cont'd) Chamber to Loadlock Substrate Transfer Fixed-Flowrate Process Gas Substrate Heat Plasma Processing DC Sputtering (Cathodes 1, 2 or 3) RF Sputtering (Cathodes 1 and 2) RF Bias Cathode Construction Cathode Disassembly Cathode Re-Assembly/System Installation 3.0" Cathode Assembly Drawing Legend \0 LIST DISCOVERyTM-18 "SOFTWARE" INTERLOCKS 6.1 Varian CC2 Sentorr Setpoints 6.2 Mechanical Pump 6.3 Turbo Pump 6.4 Chamber Rough Valve 6.5 Chamber Vent Valve 6.6 Chamber HiVac Valve 6.7 Turbo Backing Valve 6.8 Loadlock Rough Valve 6.9 Loadlock Vent Valve 6.10 Gas#l and Gas#2 Isolation Valves 6.11 Source/Stage Shutters 6.12 Rotation 6.13 Heat Power 6.14 RFX#l RF Power Supply 6.15 RFX#2 RF Power Supply 6.16 MDX DC Power Supply

4 Table of Contents Denton Vacuwn, Inc. DiscoveryTM-18 Deposition System TABLE OF CONTENTS Section Page 7. GE LADDER LOGIC PROGRAM TROUBLESHOOTING 8.1 Introduction 8.2 Basic Tool Requirements 8.3 Vacuum System Control Rack 8.4 PLC Controller 8.5 Valves and Shutters 8.6 Rotation 8.7 Substrate Heat SRC Controller 8.8 Summary SPARE PARTS LISTS 10. ELECTRICAL SCHEMATICS Description Interlock RFX Power Supply MDX 1.5K Power Supply Pumps & Valves Gas & Pressure Control Rotation Control PLC Rack Layout TCflON Gauge Control Power Distribution Heat Control Loadlock Control File Name UTA-INTL.DWG UTA-RFX.DWG UTA-MDX.DWG UTA-PUMP.DWG UTA-GAS.DWG UTA-ROTA.DWG UTA-PLC.DWG UTA-ION.DWG UTA-POWE.DWG UTA-HEAT.DWG UTA-LL.DWG 111

5 Table of Contents Denton Vacuum, Inc. DiscoveryTM-18 Deposition System TABLE OF CONTENTS Section Page 11. MECHANICAL DRAWINGS Description General Arrangement & Floor Plan Baseplate Detail Poppet Valve Assembly Air Piping Assembly Water Piping Assembly Vacuum Piping Assembly 3.0" Sputter Cathode Shutter Assembly Transport Mechanism Assembly 3 kw Heater Fixture Biasable Substrate Rotation Assembly Number D-O D-O D C l1 C-O D Q12 C-O C-Q D C C PREVENTIVE MAINTENANCE 12.1 Mechanical Pump 12.2 Deposition Chamber 12.3 Turbomolecular Pump 12.4 Sliding Seals IV

6 Denton Vacuum, Inc. Table of Contents DiscoveryTM-18 Deposition System EQUIPMENT LIST AND VENDOR MANUALS (sent with system) Advanced Energy Industries Inc. 1/ RFX600 RF Power Supply (Manual Provided) Advanced Energy Industries Inc. ATX600 Matching Network Control Panel Advanced Energy Industries Inc. ATX600 Matching Network Advanced Energy Industries Inc. MDX1.5K DC Power Supply (Manual Provided) (Manual Provided) (Manual Provided) Alcatel Vacuum Products 2021 Rotary Vane Pump (Manual Provided) Alacatel Vacuum Products ATP5150 Turbomolecular Pump (Manual Provided) Alcatel Vacuum Products CFF450 Turbopump Frequency Controller (Manual Provided) Angstrom Sciences Certificate of Analysis (Manual Provided) Granville Phillips Mini-Convectron Gauge (Manual Provided) High Vacuum Apparatus 8.0" Electro-Pneumatic Gate Valve (Manual Provided) v

7 Table of Contents Denton Vacumn, Inc. DiscoveryTM-18 Deposition System EQUIPMENT LIST AND VENDOR MANUALS (cont/d) MKS Instruments, Inc \ Type 247C Four Channel Mass Flow Controller Power Supply/Readout (Manual Provided) MKS Instruments, Inc '. /Type PDR-C-IC Power Supply/Readout (Manual Provided) MKS Instruments, Inc Type 127AA-OOO.IC Capacitance Manometer (Manual Provided) MKS Instruments, Inc 2259C Mass Flow Controllers (Manual Provided) Omega Instruments icn76000 Temperature Controller (Manual Provided) Varian Vacuum Products CC2 Sentorr Gauge Controller (Manual Provided) VI

8 Introduction Denton Vacuum, Inc. Discoveryn.q8 Deposition System 1. INTRODUCTION The Denton Vacuum DiscoveryTM-18 Deposition System is designed for either thin film production or research. The DiscoveryTM-18 configuration provides easy access to substrates, sources, and instrumentation while maintaining excellent pumping characteristics. This system is designed to simplify the geometries necessary for the coordination of multiple source depositions. Because Denton uses the finest available subsystems and components, the system is highly reliable and durable. The system's inherent flexibility allows for the operation of three sputter sources and the ability to heat, RF bias, and rotate the substrate. The DiscoveryTM-18 is semiautomatic; controlled by a General Electric Programmable Logic Controller (PLC). The system's power supplies and instrumentation are installed in a control cabinet conveniently located next to the chamber for easy observation and operation. The system offers the user a myriad of thin film process possibilities. However, it is important to note that with all of this system's potential there exists safety considerations. Individuals who are to operate, service or maintain this system should familiarize themselves with this manual. I-I

9 Introduction Denton Vacuwn, Inc. DiscoveryTM-18 Deposition System 1-2

10 Safety Warnings Denton Vacuwn, Inc. Discoveryl"M-18 Deposition System 2. SAFETY WARNINGS This vacuum deposition system is comprised of a number of complex subsystems. LETHAL VOLTAGES, HIGH TEMPERATURES, HIGH PRESSURES AND POWERFUL MECHANICAL DRIVE MECHANISMS ARE PRESENT THROUGHOUT THE SYSTEM. Every attempt has been made to safeguard operating and maintenance personnel. Interlocking of sub systems provides a high degree of operator safety. SYSTEM/SOFTWARE INTERLOCKS SHOULD NEVER BE DEFEATED UNLESS SERVICING OF THE SYSTEM REQUIRES TEMPORARY INTERLOCK OVERRIDES. HARDWIRED SAFETY INTERLOCKS MUST NEVER BE DEFEATED. All safety/software interlocks should be returned to operational status when problems have been corrected. Operating and maintenance manuals have been provided and should be thoroughly understood before any operations are contemplated. 2-1

11 Safety Warnings Denton Vacuwn, Inc. Discoveryr\1-18 Deposition System 2-2

12 System Specifications Denton Vacuwn, Inc. Discoverynq8 Deposition System 3. SYSTEM SPECIFICATIONS 3.1 DEPOSITION CHAMBER 304L stainless steel chamber, measuring approximately 18" (diameter) x 13.5" (deep). Full-diameter, top-opening access flange, mounted via articulating hinges to the deposition chamber. Access flange is supported by two gas-pressurized struts to facilitate loading and unloading operations. Viewports: (1) optically shielded 4.00" diameter viewport (chamber sidewall) to permit unrestricted viewing of all installed deposition sources and substrate fixturing. Bottom mounted pumping plenum (off chamber baseplate). The following chamber penetrations will be provided: Baseplate: a) (1) 8.00" (pumping plenum) b) (15) 1.00" (instrumentation, gas, spares) c) (1) 3.38" CF (substrate rotation) Sidewall: a) (1) 4.00" viewport (optically shielded) b) (2) 2.75" CF c) (1) 1.33 mini-cf d) (1) 10.0" CF (rotatable, loadlock expansion) Top-plate: a) (3) 1.12" compression seal (sputter cathodes) b) (3) 0.25" (shutter rotary feedthroughs) Pumping Plenum: a) (1) NW100 (high vacuum pump) b) (1) 0.75" compression seal (vacuum gauge) c) (1) NW25 (roughing valve)) d) (1) NWI6 (vent valve/vacuum safety) e) (1) 3.50" (high vacuum bellows valve actuator) 3-1

13 System Specifications Denton VacUlun, Inc. DiscoveryTM-18 Deposition System 3.2 LOADLOCK CHAMBER 304L stainless steel chamber, electro-polished, measuring approximately 8.0" (diameter) x los' (long). 8.0" electro-pneumatic, hivac gate valve (CF flanging). 8.0 " diameter, side-loading door, electric transfer drive The following loadlock penetrations will be provided: a) (1) 2.75" CF b) (1) 1.33 mini-cf (vacuum gauge) c) (1) NW25 (loadlock roughing) d) (1) VCO-4 stub (vent valve) 3.3 DEPOSITION CHAMBER PUMPING SYSTEM Alcatel ATP5150 turbomolecular pump (NWlOO inlet flange, particulate screen, air-cooled) with Alcatel CFF450 frequency convertor. Alcatel 2021 two-stage, rotary vane pump (14.6 CFM). NW25 foreline filter DVI 5.0" electro-pneumatic, internal hivac poppet valve. NW25 bellows-sealed, electro-pneumatic, roughing valve. NW25 bellows-sealed, electro-pneumatic, turbo backing valve. 0.25" VCO, bellows-sealed, electro-pneumatic vent valve. 0.25" electric, mechanical pump vent valve (slaved to mechanical pump status). KF-25 manual valve (leak checking), mounted on foreline. 3-2

14 System Specifications Denton Vacuwn, Inc. Discoverynq8 Deposition System 3.4 LOADLOCK PUMPING SYSTEM Utilization of deposition chamber mechanical pump to achieve crossover pressure of approximately 2.0E-1 torr. 1.0" bellows-sealed, electro-pneumatic, roughing valve. VCGA bellows-sealed, electro-pneumatic, vent valve. 3.5 VACUUM GAUGING/pROCESS GAS AND PRESSURE CONTROL Varian SenTorr CC2 cold cathode/thermocouple gauge controller: Cold cathode gauge #1 (deposition chamber, gauge setpoint relay interfaced to system controller). Thermocouple gauge #1 (deposition chamber, gauge setpoint relay interfaced to system controller). Thermocouple gauge #2 (turbomolecular pump fore line, gauge setpoint relay interfaced to system controller). Granville Phillips Model 275 mini-convectron vacuum sensor pressure switch (P/N: ) for loadlock chamber crossover (2.0E-l) indication. MKS Instruments 127A (l00 mtorr FS) capacitance manometer with MKS Instruments PDR-C-1C power supply/readout. MKS Instruments 247C four-channel power supply/readout interfaced to (2) MKS 2259C mass flow controllers (100 sccm and 50 sccm full scale): each MKS 2259C supplied with close-coupled, bellows-sealed, electro-pneumatic, isolation valve, each MKS 2259C isolation valve controlled by system controller, and each MKS 2259C outfitted with dual gas-inlet capability (manual toggle-type isolation valves). 3.6 SPUTTER SOURCES (3) DVI 3.0" diameter, internal "stalk-mount", planar magnetron sputter sources: RF/DC capability, Variable source to substrate distance, and Clamp/bond target compatibility. 3-3

15 University of Utah, Job #: Ig003 System Specifications Denton VacuLUn. Inc. Discoverynqg Deposition System (3) independent, electro-pneumatic source shutters (cylinder mounted air flowrate control), each dedicated to a delivered planar magnetron, interfaced to system PLC for remote open/close operation. Cooling water flow sense on each cathode's dedicated cooling water circuit (safety interlock). Quick-disconnect cooling water lines. 3.7 SPUTTER POWER SUPPLIES (1) Advanced Energy MDX1.5K (Low Z; 700 volt) power supply: Hardwired safety interlock (chamber door, vacuum bellows safety switch, cathode water), (1) manual DC power switchbox, to shunt output of MDX supply to any of the three installed cathodes: (2) Advanced Energy RF blocking filters (PIN ) (2) Advanced Energy RFX600 RF power supplies, each coupled to an Advanced Energy ATX600 automatic match network: Hardwired safety interlock (chamber door, vacuum bellows safety switch, cathode or Bias-Stage water), Twin power output lead from match network to minimize cable heating, and Matching network configured for discrete DC power input. 3.8 RF-BIAS SUBSTRATE STAGE (1) RF-bias substrate stage (confocal source mode): (2) 10" substrate platens; one pre-machined to accept DVI's sample transfer holder and the other "blank" to support Utah's TBD substrate requirements. (2) DVI sample transfer holders: one pre-machined to accept a 150 mm diameter substrate and the other "blank" to support Utah's TBD substrate requirements. (1) DVI high performance, RF-biasable rotary motion feedthrough, 3.38" CF flanging. 3-4

16 System Specifications Denton Vacuwn, Inc. Discoverynq8 Deposition System (1) direct-drive, compact, gear motor. - Rotation speed adjust (0-20 RPM) via front panel potentiometer. 3.9 SUBSTRATE HEAT (1) 3.0 kw, backside quartz heater array with reflector and deposition shield. 208/110 VAC step-down/isolation transformer to minimize possibility of spurious glow discharges and feedback from sputter power supplies. 3.0 kw PI temperature control system (Omega CN76000 temperature controller, interfaced to system PLC for remote on/off operation. Manual setpoint. (1) sheathed thermocouple positioned internally in chamber SYSTEM CONTROL AND AUTOMATION GE-Fanuc programmable logic controller (PLC) with membrane-type operator interface. EEPROM memory backup. Valve control/sequencing, pump operation, and "soft" system interlocks (i.e., non-safety related) controlled by the PLC. The following operating modes provided: AUTOPUMP (automatic loadlock and chamber pumpdown to high vacuum conditions), AUTOVENT (automatic loadlock and chamber venting to atmospheric pressure), MANUAL (permits manual (front panel) system operation and interruption of in-process automatic system sequences), and MAINTENANCE MODE (key-switch selectable from MANUAL mode; permits all MANUAL MODE functionality, "soft" system valve interlocks disabled. All "hard" safety interlocks remain operational). 3-5

17 University of Utah. Job #: System Specifications Denton Vacuwn, Inc. DiscoveryTM-18 Deposition System 3.11 UTILITIES Electrical: 208 VAC, 60 Hz, 1 phase, 4 wire (60 A) Cooling water: Imin, degrees Centigrade, 3-4 bar differential between supply and return (6 bar maximum inlet pressure): Four-circuit water manifold (metering on supply and return side); circuit designation follows: 1.) Sputter cathode #1 (flow sense/interlock) 2.) Sputter cathode #2 (flow sense/interlock) 3.) Sputter cathode #3 (flow sense/interlock) 4.) RF Bias Stage (flow sense/interlock) Compressed air: Ihr, normal dry shop air, 6-7 bar (system valve operation): dew point: maximum of 2 degrees Centigrade oil content: 1-5 mg/m 3 foreign particles, size: maximum of 5 microns foreign particles, concentration: maximum of 5 mg/m 3 Nitrogen: (preferentially evaporated from liquid N 2 ) 0.5 bar (chamber venting, 100 l/cycle, optional) 0.5 bar (loadlock venting, 10 1Icycle, optional) Process gas: 5N purity 0.5 bar (customer supplied) 3.12 SYSTEM DOCUMENTATION Three complete sets of operating instruction manuals; instruction manuals to include preventive maintenance procedures/timetable, troubleshooting guides, and fully-costed spare parts listing. One complete set of sub-assembly vendor manuals. Three complete sets of electrical schematics (B-size). One complete set of electrical schematics (AUTOCAD.DWG format). Three complete sets of mechanical drawings necessary for system maintenance and repair (D-size). 3-6

18 System Specifications Denton Vacuwn, Inc. Discoverynq8 Deposition System 3.13 SPUTTER TARGETS 3.0" diameter x 0.062" thick; gold target (4N purity). 3.0" diameter x 0.062" thick; platinum target (4N purity). 3.0" diameter x 0.125" thick; copper target (5N purity). 3.0" diameter x 0.125" thick; aluminum target (5N purity) " diameter x 0.125" thick; Si0 2 target (4N5 purity) solder bonded to DVI 3.0" backing plate (backing plate included) " diameter x 0.125" thick; Si 3 N 4 target (3N5 purity) solder bonded to DVI 3.0" backing plate (backing plate included). 3-7

19 System Specifications Denton Vacuum, Inc. Discoveryn.'-l8 Deposition System 3-8

20 System Operation Denton Vacuwn, Inc. DiscoveryrM-18 Deposition System 4. SYSTEM OPERATION 4.1 COLD START 1. Turn ON main system disconnect located on rear of system instrumentation cabinet; ensure that all utilities and process gases are installed and,)perational. 2. Push the green START button located near the top of rack cabinet. At this point, power to the system and the system PLC will be applied. 3. Power-up the following subsystems and instrumentation: Varian CC2 cold cathode/thermocouple gauge controller (power is applied by toggling the front panel STANDBY key), MKS PDR-C-IC capacitance manometer power supply/readout, MKS 247C mass flow controller power supply, Turn ON channels 1 and 2, Advanced Energy MDX1.5K 1.5 kw DC power supply, both Advanced Energy RFX 600 W RF power supplies, and both Advanced Energy ATX automatic matching networks. 4. Select (instrument front panel) the following configuration on the following subsystems and instrumentation: "AUTO ON" and "TORR" display units on the Varian CC2 cold cathode/thermocouple gauge controller, "FLOW" mode for each channel (1-4) on the MKS 247C flow controller, "MM HG" display units on the PDR-C-IC power supply, "LOCAL SIGNAL", "LOCAL CONTROL", and "FWD POWER REGULATION" mode for each RFX600 RF power supply (Ensure that the left display is indicating "FORWARD PWR" and the right display is indicating "REFLECTED POWER"), "AUTa" mode for each ATX600 RF matching network controller (Ensure that the bar graphs are set up to read capacitor position). "POWER REGULAnON" on the MDX1.5K DC power supply 4-1

21 System Operation Denton Vacuwn, Inc. DiscoveryTM-18 Deposition System 5. Ensure that the following setpoints and limits are entered into the Varian CC2 cold cathode/thermocouple gauge controller: TC_l (Chamber): 2.0E-l torr (Isolation Valve Crossover), and TC_2 (Turbo foreline): 5.0E-l torr (Hivac Valve Crossover). Please refer to the Varian Sentorr manual on the proper procedure to display and alter setpoints. 6. Ensure that the following setpoints are entered (rear input) into the MKS 247C power supply/readout: Channel 1 display: (Full scale flowmeter rating)(gcf), and Channel 2 display: (Full scale flowmeter rating)(gcf). Please refer to the MKS 247C manual on the proper procedure to display and alter gas correction factors and setpoints. 7. Ensure that the following limits are entered into the Advanced Energy RFX600 power supplies: RFX #1: 600 W maximum RF power, and RFX #2: 600 W maximum RF power. 8. Ensure that the loadlock transfer arm is fully retracted. 9. Ensure that the system keyswitch is set in the Manual Mode position. 10. Ensure that the loadlock lid is in place and that the loadlock isolation valve is fully closed. 11. Ensure that the chamber lid is lowered, the latch is engaged, and positive contact has been made with the lid sensor switch. 12. Depress the "AUTO ENABLE" switch and ensure that the "AUTO ENABLE" LED indicator is not flashing. 13. Tum on the mechanical pump; wait 60 seconds. 4-2

22 System Operation Denton Vacuum, Inc. DiscoveryTM-18 De(XlSition System 14. Open the turbopump backing valve; wait until the pressure indicated on TC_2 is less than 50 millitorr (the turbopump can be started once it is backed by the mechanical pump; waiting until the "stub" pressures approached the mechanical pump's blank off value ensures that there are no major leaks below the high vacuum valve). 15. Turn on the turbomolecular pump. 16. Wait until the turbopump has completed its' acceleration and has attained full rotational speed (indicated on the CFF450 frequency by a change in the status LED's color from yellow to green). Note: If the CFF450 frequency convertor LED is red then a fault is present and the user should immediately contact Denton Vacuum or Alcatel Vacuum Products! 17. Add LN z to the cold trap (optional). A full charge of LNz will keep the trap cold for approximately 2-4 hours. 18. Depress the "AUTO ENABLE" switch and ensure that the "AUTO ENABLE" LED indicator is flashing. 19. Depress the "Chamber Autopump" keyswitch to initiate the automatic chamber pumping process. At the completion of this automatic pumping sequence the "Chamber Autopump" LED indicator will be extinguished and the chamber will be in high vacuum status. Note: If the "CHAMBER AUTOPUMP" softkey is depressed before the completion ofthe automatic cycle (i.e., the autocycle LED is still flashing when the key is depressed) then the automatic cycle will be tenninated and the machine will remain in the valve state at which the termination was initiated! 4.2 SYSTEM PUMPING AND VENTING MAIN CHAMBER PUMPING - AUTOMATIC MODE I. Ensure that steps I through 17 of the Cold Start Procedure (Section 4.1) have been successfully completed. 4-3

23 System Operation Denton VaculU11, Inc. DiscoveryfM-18 Deposition System 2. Depress the "AUTO ENABLE" switch and ensure that the "AUTO ENABLE" LED indicator is flashing. 3. Depress the "Chamber Autopump" keyswitch to initiate the automatic chamber pumping process. At the completion of this automatic pumping sequence the "Chamber Autopump" LED indicator will be extinguished and the chamber will be in high vacuum status MAIN CHAMBER PUMPING - MANUAL MODE 1. Ensure that steps 1 through 17 of the Cold Start Procedure (Section 4.1) have been successfully completed. 2. Depress the "AUTO ENABLE" switch and ensure that the "AUTO ENABLE" LED indicator is not flashing. 3. Close the turbomolecular pump backing valve. 4. Open the chamber rough valve. Pump the main chamber until the pressure indicated on TC_l is less than 2.0E-l torr. 5. Close the chamber rough valve. 6. Open the turbomolecular pump backing valve. Wait until the pressure indicated on TC_2 is less than 1.0E-2 torr. 7. Open the chamber hivac valve LOADLOCK PUMPING - AUTOMATIC MODE 1. Ensure that steps 1 through 17 of the Cold Start Procedure (Section 4.1) have been successfully completed. 2. Depress the "AUTO ENABLE" switch and ensure that the "AUTO ENABLE" LED indicator is flashing. 4-4

24 University of Utah, Joh #: System Operation Denton Vacuwn, Inc. DiscoveryrM-18 Deposition System 3. Depress the "Loadlock Autopump" keyswitch to initiate the automatic chamber pumping process. At the completion of this automatic pumping sequence the "Loadlock Autopump" LED indicator will be extinguished and the loadlock will be ready for exposure to the main chamber. Note: If the "LOADLOCK AUTOPUMP" softkey is depressed before the completion of the automatic cycle (i.e., the autocycle LED is still flashing when the key is depressed) then the automatic cycle will be terminated and the machine will remain in the valve state at which the termination was initiated! LOADLOCK PUMPING - MANUAL MODE 1. Ensure that steps 1 through 17 of the Cold Start Procedure (Section 4.1) have been successfully completed. 2. Depress the "AUTO ENABLE" switch and ensure that the "AUTO ENABLE" LED indicator is not flashing. 3. Close the turbomolecular pump backing valve. 4. Open the loadlock rough valve. Pump the loadlock until the "loadlock setpoint" LED is illuminated on the Granville Phillips Model 275 mini-convectron (the setpoint of the 275 was preset at the factory to 200 mtorr). 5. Wait 20 seconds. 6. Close the loadlock rough valve. 7. Open the turbomolecular pump backing valve MAIN CHAMBER VENTING - AUTOMATIC MODE 1. Ensure that the loadlock transfer arm is fully retracted and the "Sample Holder OUT" LED is illuminated. 4-5

25 System Operation Denton Vacuum, Inc. DiscoveryTM-18 Deposition System 2. Ensure that the loadlock isolation gate valve is fully closed. 3. Ensure that the system keyswitch is set in the Manual Mode position. 4. Tum off all internal sources of energy (RF power, DC power, and heat). 5. Depress the "AUTO ENABLE" switch and ensure that the "AUTO ENABLE" LED indicator is flashing. 6. Depress the "Chamber Autovent" keyswitch to initiate the automatic chamber venting process. At the completion of this automatic venting sequence the "Chamber Autovent" LED indicator will be extinguished and the chamber will be vented to atmospheric pressure. Note: If the "CHAMBER A UTOVENT" softkey is depressed before the completion of the automatic cycle (i.e., the autocycle LED is still flashing when the key is depressed) then the automatic cycle will be terminated and the machine will remain in the valve state at which the termination was initiated! MAIN CHAMBER VENTING - MANUAL MODE 1. Ensure that the loadlock transfer arm is fully retracted and the "Sample Holder OUT" LED is illuminated. 2. Ensure that the loadlock isolation gate valve is fully closed. 3. Ensure that the system keyswitch is set in the Manual Mode position. 4. Tum off all internal sources of energy (RF power, DC power, and heat). 5. Depress the "AUTO ENABLE" switch and ensure that the "AUTO ENABLE" LED indicator is not flashing. 6. Close (if open) the hivac valve. 7. Close (if open) the chamber rough valve. 4-6

26 System Operation Denton Vacuwn, Inc. DiscoveryTM-18 Deposition System 8. Close (if open) the gas #1 and gas #2 isolation valves. 9. Open the chamber vent valve. When chamber is fully vented and the chamber lid seal is broken, close the chamber vent valve LOADLOCK VENTING - AUTOMATIC MODE 1. Ensure that the loadlock transfer arm is fully retracted and the "Sample Holder OUT" LED is illuminated. 2. Ensure that the loadlock isolation gate valve is fully closed. 3. Ensure that the system keyswitch is set in the Manual Mode position. 4. Depress the "AUTO ENABLE" switch and ensure that the "AUTO ENABLE" LED indicator is flashing. 5. Depress the "Loadlock Autovent" keyswitch to initiate the automatic loadlock venting process. At the completion of this automatic venting sequence the "Loadlock Autovent" LED indicator will be extinguished and the loadlock will be vented to atmospheric pressure. Note: If the "LOADLOCK AUTOVENT" softkey is depressed before the completion of the automatic cycle (i.e., the autocycle LED is still flashing when the key is depressed) then the automatic cycle will be terminated and the machine will remain in the valve state at which the termination was initiated! LOADLOCK VENTING - MANUAL MODE 1. Ensure that the loadlock transfer arm is fully retracted and the "Sample Holder OUT" LED is illuminated. 2. Ensure that the loadlock isolation gate valve is fully closed. 3. Ensure that the system keyswitch is set in the Manual Mode position. 4-7

27 System Operation Denton Vacuwn, Inc. DiscoveryTM-18 Deposition System 4. Depress the"auto ENABLE" switch and ensure that the"auto ENABLE" LED indicator is not flashing. 5. Close (if open) the loadlock rough valve. 6. Open the loadlock vent valve. When loadlock is fully vented and the loadlock lid can be opened, close the loadlock vent valve. 4.3 MANUAL PROCESSING LOADLOCK TO CHAMBER SUBSTRATE TRANSFER 1. Ensure that the loadlock has been vented to atmospheric pressure. 2. Ensure that the loadlock transfer arm is fully retracted and the "Sample Holder OUT" LED is illuminated. Load appropriate substrate onto substrate transfer arm (transfer disk MUST be resting against fork back-stop!) 3. Ensure that loadlock and main chamber are in vacuum status. 4. Depress the "AUTO ENABLE" switch and ensure that the "AUTO ENABLE" LED indicator is not flashing. 5. Open the loadlock gate valve (insure that all in-situ processes have been completed!!). 6. Ensure that the substrate transfer arm is in the "UP" position. 7. Depress the "AUTO ENABLE" switch and ensure that the "AUTO ENABLE" LED indicator is flashing. 8. Depress the "Sample Holder In" keyswitch to initiate the automatic transfer insertion process. While the sample is driven into the chamber, the "Sample Holder In" LED will flash. Once the sample is fully driven into the chamber the "Sample Holder In" LED indicator will be continuously illuminated. 4-8

28 System Operation Denton Vacuwn, Inc. DiscoveryTM-18 Deposition System 9. Lower the substrate transfer arm to the "DOWN" position. 10. Depress the "Sample Holder Out" keyswitch to initiate the automatic transfer insertion process. While the sample is driven into the loadlock, the "Sample Holder Out" LED will flash. Once the sample is fully driven into the loadlock the "Sample Holder Out" LED indicator will be continuously illuminated. 11. Depress the "AUTO ENABLE" switch and ensure that the "AUTO ENABLE" LED indicator is not flashing. 12. Close the loadlock gate valve CHAMBER TO LOADLOCK SUBSTRATE TRANSFER 1. Ensure that the loadlock has been venteg. to atmospheric pressure. 2. Ensure that the loadlock transfer arm is fully retracted and the "Sample Holder OUT" LED is illuminated. 3. Ensure that loadlock and main chamber are in vacuum status. 4. Depress the "AUTO ENABLE" switch and ensure that the "AUTO ENABLE" LED indicator is not flashing. 5. Open the loadlock gate valve (insure that all in-situ processes have been completed!!). 6. Ensure that the substrate transfer arm is in the "DOWN" position. 7. Depress the "AUTO ENABLE" switch and ensure that the "AUTO ENABLE" LED indicator is flashing. 8. Depress the "Sample Holder In" keyswitch to initiate the automatic transfer insertion process. While the sample is driven into the chamber, the "Sample Holder In" LED will flash. Once the sample is fully driven into the chamber the "Sample Holder In" LED indicator will be continuously illuminated. 4-9

29 System Operation Denton Vacuwn, Inc. Discoverynq8 Deposition System 9. Raise the substrate transfer arm to the "UP" position. 10. Depress the "Sample Holder Out" keyswitch to initiate the automatic transfer insertion process. While the sample is driven into the loadlock, the "Sample Holder Out" LED will flash. Once the sample is fully driven into the loadlock the "Sample Holder Out" LED indicator will be continuously illuminated. 11. Depress the "AUTO ENABLE" switch and ensure that the "AUTO ENABLE" LED indicator is not flashing. 12. Close the loadlock gate valve FIXED-FLOWRATE PROCESS GAS (SPUTTERING/pRESSURE CONTROL) 1. Ensure that process gas (5-10 psig) is supplied to the appropriate MKS 2259C mass flow controller(s). 2. Refer to the MKS 247 and MKS 2259C manuals for all adjustment procedures. 3. Ensure that the correct gas correction factor is set for each mass flow controller on the rear of the MKS 247C. 4. Ensure that power has been applied to the MKS 247C and PDR-C-IC for at least 8 hrs (necessary to establish thermal equilibrium for the mass flow controllers and capacitance manometer). 5. Zero the mass flow controller(s); this process can only be accomplished with the appropriate gas isolation valves closed. 6. Adjust the setpoint potentiometer for each channel to the desired flowrate. Don't forget to depress the setpoint display switch and set the display select switch for each channel. 7. Ensure that the chamber is under high vacuum status (pressure < l.oe-5 torr). 4-10

30 System Operation Denton VaculUD, Inc. DiscoveryTM-18 Deposition System 8. Zero the capacitance manometer. 9. Toggle the "AUTO ENABLE" keyswitch so that the "AUTO ENABLE" LED indicator is not flashing. 10. Open the appropriate gas isolation valve (Gas #1 or Gas #2). 11. Adjust the setpoint potentiometer for each flow channel to achieve the desired pressured, indicated on the PDR-C-IC readout. Remember: the units of display on the PDR-C-IC readout are xx.xx mtorr! SUBSTRATE HEAT 1. Prior to any attempt at processing, ensure that the quartz lamp housing is installed in the main chamber and that the electrical connections have been made to the power feedthrough (polarity is not important). 2. Ensure that main chamber has been pumped to a state of high vacuum and that substrate has been transferred from the loadlock onto the substrate table. 3. Toggle the "AUTO ENABLE" keyswitch so that the "AUTO ENABLE" LED indicator is not flashing. 4. Tum on substrate rotation. Verify that the substrate stage is rotating at the appropriate speed. Note: Make sure the speed potentiometer has not been dialed down to zero! 5. Adjust the heater temperature setpoint (refer to heater controller manual for proper adjustment procedures). 6. Tum on heat power. Allow temperature to stabilize (if serious undershoot or overshoot occurs, re-tune heater control using procedure outlined in heater control manual). 4-11

31 System Operation Denton Vacuwn, Inc. Discoveryf\1-18 Deposition System 4.4 PLASMA PROCESSING DC SPUTTERING (CATHODES 1, 2, OR 3) 1. Ensure that main chamber has been pumped to a state of high vacuum and that substrate has been transferred from the loadlock onto the substrate table (refer to Section 4.3.1). 2. Toggle the "AUTO ENABLE" keyswitch so that the "AUTO ENABLE" LED indicator is not flashing. 3. Establish a suitable flow of gas into the chamber; achieving a process pressure of > 1 mtorr indicated by the MKS 127A capacitance manometer (refer to Section 4.3.3). 4. Verify and ensure that a the MDX1.5K DC power supply is set for "Power Regulation". 5. Program the Ramp Timer on the MDX1.5K DC power supply. The Ramp Timer is adjusted by first pressing the MDX's "SETPT" switch until the "SECONDS" LED lights on the unit's right hand display and then adjusting the "RAMP ADJUST" potentiometer. Five to ten seconds is generally a suitable period. 6. Program the Setpoint Level on the MDX1.5K DC power supply. The Setpoint Level is adjusted by first pressing the MDX's "SETPT" switch until the "WATIS" LED lights on the unit's right hand display and then adjusting the "LEVEL" potentiometer. 7. Ensure that the "INTLK" LED is illuminated. This LED is illuminated when the safety interlocks to the power supply are satisfied (Refer to Section 6 of this manual). 8. Close all cathode shutters. 9. Turn on substrate rotation. Verify that the substrate stage is rotating at the appropriate speed Note: Make sure the speed potentiometer has not been dialed down to zero! 4-12

32 System Operation Denton Vacuwn, Inc. DiscoveryTM-18 Deposition System 10. Select the desired sputter cathode by toggling the "Sputter Head Select" Keyswitch. The active sputter head will be indicated by a continuously illuminated LED above the "Sputter Head #1/#2/#3" display pads. Note: Never change the active sputter head while the MDX power supply is operational In addition, it is good practice to "park" the DC switching network in the "off" position (i.e., none of the "Sputter Head #1/#2/#3" display pads are illuminated) when the DC supply is not in use. 11. Apply power to the cathode by depressing the "OUTPUT ON" key. At this point power will be ramped to the preset level over the preset period! 12. Soak (Le., presputter) the target for approximately 15 to 30 seconds. Presputtering is necessary to insure the target's thermal equilibrium and a clean (on an atomistic scale) target. 13. Verify once again that the substrate is rotating. 14. Open the corresponding cathode shutter. Deposit for the prescribed time period. 15. Turn off power to the cathode by depressing the "OUTPUT OFF" key. 16. Close the cathode shutter. 17. Turn off substrate rotation. 18. Close process gas isolation valve(s). 19. Ensure that the loadlock is in vacuum status. 20. Transfer sample from main chamber to system loadlock (refer to Section 4.3.2). 21. Allow substrate to cool under vacuum before exposure to atmospheric pressure. This step is necessary to ensure that the freshly deposited film will not be oxidized. 4-13

33 University of Utah. Job #: System Operation Denton Vacuwn, Inc. DiscoveryT\1-l8 Deposition System RF SPUTTERING (CATHODES 1 AND 2) 1. "Park" the DC switching network in the "off" position (i.e., none of the "Sputter Head #1/#2/#3" display pads are illuminated). Even though RF blocking filters are installed in the DC inputs to the Cathode 1 and Cathode 2 matching networks, it always pays to take the safest system approach. 2. Ensure that main chamber has been pumped to a state of high vacuum and that substrate has been transferred from the loadlock onto the substrate table (refer to Section 4.3.1). 3. Toggle the "AUTO ENABLE" keyswitch so that the "AUTO ENABLE" LED indicator is not flashing. 4. Establish a suitable flow of gas into the chamber; achieving a process pressure of > 1 mtorr indicated by the MKS 127A capacitance manometer (refer to Section 4.3.3). 5. Verify the setpoint of the RF power supply you intend to use. Remember: you don't know what output level was programmed by the previous user of the system!!! 6. Momentarily place the corresponding ATX600 automatic matching network in manual mode. Ensure that the ATX 600 display is indicating capacitor position. Manually adjust BOTH capacitor positions to the center of the control span. This action will preset the networks capacitors in the center position; an ideal location to start a matching algorithm (Preset 1 and Preset 2 can also be used to achieve this goal. Please refer to the ATX600 manual for further instructions.) 7. Close cathode shutter (if open). 8. Turn on substrate rotation. Verify that the substrate stage is rotating at the appropriate speed. Note: Make sure the speed potentiometer has not been dialed down to zero! 4-14

34 System Operation Denton Vacuwn, Inc. DiscoveryTM-18 Deposition System 9. Verify that all interlocks are satisfied and reset the interloc k string by depressing the "RF OFF" toggle switch. If all interlocks are satisfied the "RF OFF" and "INTLK" indicators will be steadily illuminated. 10. Turn on the RF power by depressing the "RF ON" key. In general, it will be difficult to light off the RF target if there are no other sources of electrons in the chamber. A convenient way to ensure ignition is to momentarily raise system pressure (by closing the hivac valve until ignition occurs) OR lighting off (with closed shutter) one of the other cathodes with the DC power supply. If an RF discharge is established which is not stable then it may be necessary to repeat step #6 to re-initialize the matching network. Once a stable plasma is established, the process pressure can be dropped to approximately 1 millitorr (if required). 11. Soak (Le., presputter) the target for approximately 1 to 2 minutes. Presputtering is necessary to insure thermal equilibrium and a clean (on an atomistic scale) target. 12. Verify once again that the substrate is rotating. 13. Open the cathode shutter. Deposit for the prescribed time period. 14. Close the cathode shutter. 15. Turn off the RF power by depressing the "RF OFF" key. 16. Turn off substrate rotation. 17. Close process gas isolation valve(s). 18. Transfer sample from main chamber to system loadlock (refer to Section 4.3.2). 19. Allow substrate to cool under vacuum before exposure to atmospheric pressure. This step is necessary to ensure that the freshly deposited film will not be oxidized. 4-15

35 University of Utah, Job #: ISoo3 System Operation Denton Vacuwn, Inc. Discoveryn.qS Deposition System RF BIAS This system has been delivered to the University of Utah with an RF bias stage. assumed that at some point in the future, an RFX600 power supply and ATX600 matching network will be installed on the system. It is 1. Ensure that main chamber has been pumped to a state of high vacuum and that substrate has been transferred from the loadlock onto the substrate table (refer to Section 4.3.1). \ 2. Toggle the "AUTO ENABLE" keyswitch so that the "AUTO ENABLE" LED indicator is not flashing. 3. Establish a suitable flow of gas into the chamber; achieving a process pressure of > 1 mtorr indicated by the MKS 127A capacitance manometer (refer to Section 4.3.3). 4. Verify the setpoint of the RF Bias power supply. Remember: you don't know what output level was programmed by the previous user of the system!!! 5. Momentarily place the Bias ATX600 automatic matching network in manual mode. Ensure that the ATX600 display is indicating capacitor position. Manually adjust BOTH capacitor positions to the center of the control span. This action will preset the networks capacitors in the center position; an ideal location to start a matching algorithm (Preset 1 and Preset 2 can also be used to achieve this goal. Please refer to the ATX600 manual for further instructions.) 6. Turn on substrate rotation. Verify that the substrate stage is rotating at the appropriate speed. Note: Make sure the speed potentiometer has not been dialed down to zero! 7. Verify that all interlocks are satisfied and reset the interlock string by depressing the "RF OFF" toggle switch. If all interlocks are satisfied the "RF OFF" and "INTLK" indicators will be steadily illuminated. 4-16

36 System Operation Denton Vacuwn, Inc. DiscoveryTM-18 Deposition System 8. Tum on the Bias RF power by depressing the "RF ON" key. In general, it will be difficult to light off the RF target if there are no other sources of electrons in the chamber. A convenient way to ensure ignition is to momentarily raise system pressure (by closing the hivac valve until ignition occurs) OR lighting off (with closed shutter) one of the sputter cathodes with the DC power supply. If an RF discharge is established which is not stable then it may be necessary to repeat step #6 to re-initialize the matching network. Once a stable plasma is established, the process pressure can be dropped to approximately 1 millitorr (if required). 9. At this point additional RF/DC plasma processing (refer to Sections and 4.4.2) may be initiated. 10. At the conclusion of all in-situ processing, tum off the Bias RF power by depressing the "RF OFF" key. 11. Tum off substrate rotation. 12. Close process gas isolation valve(s). 13. Transfer sample from main chamber to system loadlock (refer to Section 4.3.2). 14. Allow substrate to cool under vacuum before exposure to atmospheric pressure. This step is necessary to ensure that the freshly deposited film will not be oxidized. 4.5 CATHODE CONSTRUCTION Removal/reinstallation of a cathode backing plate (necessary for bonded target changes) can be achieved by the following procedures. Please be sure to refer to the 3.0" cathode assembly drawing (C ) and the balloon descriptions which are listed in Section

37 System Operation Denton Vacuwn, Inc. Disclweryn'-18 Deposition System CATHODE DISASSEMBLY 1. Close the cathode water supply and return valves. These valves are located by the utility service plate on the system frame. 2. Make sure all power supplies are completely powered down. 3. Disconnect the power lead to cathode. Make sure the connector body is supported as the shell is loosened. 4. Remove the three, 4-40 socket head cap screws (#26) which secure the utility housing (#16) to the connector body (#15). Place the screws in a container which cannot be tipped over! Gently slide the utility housing back over the two 0.25" water lines. Ensure that all internals are exposed and accessible. 5. Locate a metal pan or dish. Mark both water lines as to where they are inserted on the water manifold (#5). Loosen both water fittings and place both water lines in the tray to drain. 6. Grasp the shaft of the cathode and at the same time remove the water manifold (#5) from the tube. The water manifold may require a wrench to loosen it from the body. Extract the manifold from the tube and ensure that the internal o-ring (#32) has not been dislodged. 7. Remove the thin nut (#22) from the tube. Loosen the two socket head set screws (#30) in the connector body and gently slide the connector body off the tube. 8. Ensure that the main chamber is vented to atmospheric pressure. 9. Loosen the split collar which secures the cathode's shutter blade to the shutter rotary motion. Remove the shutter blade. 10. Disengage the two gas struts which support the chamber's top plate. Tilt the plate back so that the cathode is completely exposed. NOTE: This is a two person job!! 4-18

38 System Operation Denton Vacuwn. Inc. DiscoveryTM-18 Deposition System 11. Remove the split collar which secures the cathode shaft above the chamber lid's compression fitting. Loosen the shaft tube compression fitting and GENTLY slide the cathode down through the fitting. BE CAREFUL!!! The outside shaft of the cathode is a sealing surface. Slide the cathode out straight and try not to rock it from side to side. Any small scratches can be buffed out later with 320 grit emery paper. 12. Gently lower the chamber top plate so that it rest's on the seal surface. 13. Remove the three socket head cap screws (#20) which secure the dark space shield cover (#10) to the seal base assembly (#11). Remove the dark space shield cover. 14. Place the cathode body on a work bench and position the tube vertically. Grasp the shaft and at the same time loosen and then remove the compression nut (#21). Remove the metal washer (#23) and the alumina washer (#14). Slide the seal base assembly (#11) up and over the alumina insulator tube (#13). Inspect the seal base assembly's o-ring (#27) for and nicks or debris and place face down on a clean surface. 15. Slide the alumina insulator tube (#13) over the base assembly (#3) and then slide the alumina seal washer (#12) over the base assembly (#3). 16. Remove the vented, socket head cap screws (#28) which secure the backing plate assembly (#2) to the base assembly (#3). DO NOT LOSE THESE SCREWS!! After all the screws ore removed, gently twist/slide the backing plate straight down and off the base assembly. Inspect the o-ring (#31) for damage and.debris. Ensure that the backing plate seal surface is not scratched. 17. At this point the magnet assembly may be removed from the backing plate. Drain all water from the backing plate. Remove the stand-off bushing (#29) then grasp the pole piece (#7) between thumb and forefinger; pull straight out CATHODE RE-ASSEMBLY/SYSTEM INSTALLATION 1. Using a Magnaprobe, ensure that the polarity between the inner and outer magnet races (#38 and #39), as they are mounted on the pole piece (#7), is OPPOSED! If 4-19

39 System Operation Denton Vacuwn, Inc. DiscoveryT\1-18 Deposition System these two magnets show the same polarity then the device will no longer function as a magnetron!! 2. Insert the magnet assembly (magnets face down) into the backing plate (#2) by grasping the pole piece between the thumb and forefinger and pushing straight down. Ensure that both magnets are seated into the recesses which have been machined in the bottom of the backing plate. Insert the stand-off bushing (#29). 3. Remove the a-ring (#31) from the base assembly (#3). Clean the sealing surface with a lint-free cloth. Ensure that the a-ring is damage free, debris free, and lightly greased with silicon hi-vacuum grease (Dow Corning DC976 or equivalent). Insert the a-ring (#31) on the base assembly. Be careful not to twist the a-ring (pay attention to the a-rings parting line!!) as it is inserted onto the step. Note: Lightly greased implies that a small amount of grease was first applied to thumb and forefinger and then transferred to the o-ring in a reciprocating manner so that it appears shiny under an inspection light. Do not apply excessive grease. 4. Place the backing plate assembly face down (i.e. target side down) on a work surface. Grasp the base assembly (#3) and insert it straight into the backing plate's recess. Make sure the backing plate's threaded holes line up with the base assembly's counter-bored, thru-holes before the two assemblies are joined. Keep the parts straight and do not apply excessive pressure. Insert the vented, socket head cap screws (#28) which secure the backing plate assembly (#2) to the base assembly (#3) and tighten in a star pattern until snug. CAUTION: Over-tightening these screws will damage the backing plate! 5. Ensure that the base's upper a-ring (#27) is damage free, debris free, and lightly greased with silicon hi-vacuum grease (Dow Coming DC976 or equivalent). Clean and inspect the alumina seal washer (#12) for chips/scratches; slide over the base assembly (#3). Clean and inspect the alumina insulator tube for chips/scratches; slide over the base assembly (#3). 6. Ensure that the seal base's lower a-ring (#27) is damage free, debris free, and lightly greased with silicon hi-vacuum grease (Dow Corning DC976 or equivalent). Slide the seal base assembly (#11) down over the alumina insulator tube (#13). 4-20

40 System Operation Denton Vacuwn, Inc. DiscoverylM-18 Deposition System 7. Slide the alumina washer (#14) and then the metal washer (#23) over the threaded portion of the base assembly (#3). Thread on the compression nut (#21) and fmger tighten. Ensure that both washers are aligned with the outside of the seal base shaft (If they are not aligned then it will be impossible to reinsert the stalk through the chamber lid compression fitting). Grasp the backing plate and tighten the compression nut. Ensure that the two washers do not slip out of alignment during the tightening process. Make sure that there is a robust compression on the two o-rings (#27) in the base and seal base. 8. Attach the dark space shield cover (#10) to the seal base assembly (#11) with the three socket head cap screws (#20). 9. Tilt the top-plate back. NOTE: This is a two person job!! 10. Gently slide the cathode shaft through the chamber lid compression fitting. BE CAREFUL!!! The outside shaft of the cathode is a sealing surface. Slide the cathode in straight and try not to rock it from side to side. Once the cathode is inserted to the proper source to substrate distance, attach the split collar which secures the cathode shaft above the chamber lid's compression fitting. Tighten the shaft tube compression fitting. 11. Re-connect the two gas struts which support the chamber's top-plate. 12. Re-attach the cathode shutter blade by tightening the split collar which secures it to the shutter rotary motion. Align the blade so that it completely covers the target. 13. Gently slide the connector body (#15) onto the seal base tube until the power connector (#17) touches the lower compression nut (#21). Tighten the two socket head set screws (#30) in the connector body and insert/tighten the thin nut (#22) with a wrench. 14. Grasp the shaft of the cathode and insert/tighten the water manifold (#5). Prevent the cathode from spinning in the chamber lid compression fitting during this operation. 4-21